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Products > Semiconductor / FPD Analysis > Failure Analysis > Thermal Emission Microscope > THEMOS-1000


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Thermal Emission Microscope


THEMOS-1000


Thermal Emission Microscope

The THEMOS-1000 thermal emission analysis tool is a system for analyzing semiconductor failures through the detection and localization of the thermal signal generated within semiconductor devices. Failure locations can be identified rapidly with high precision through the superimposition of the thermal emission image detected by the high-precision thermal detector and the high resolution pattern image obtained from an IR confocal laser.


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FEATURES
・  Equipped  with  IR-confocal  laser  microscope
・  High  sensitivity  thermal  detector  (InSb)  used
・  Optimally  designed  IR  optics
・  PHEMOS-like  operation
・  Analysis  of  thermal  emissions  image  through  the  backside
・  Photoemission  analysis  possible  with  InGaAs  camera
・  Superimposition  of  thermal  and  OBIRCH  images
APPLICATIONS
・  Short-circuit  of  metalization
・  Abnormality  of  contact  holes
・  Microplasma  leakage  in  oxide  layer
・  Oxide  layer  breakdown
・  TFT  leakage  location  identification
・  Organic  EL  leakage  location  detection
・  Observation  of  location  of  temperature  abnormalities  in  devices  during  the  development  of  new  semiconductor  devices



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