Semiconductor / FPD Analysis

This is an imaging and analysis system that picks up light emissions, heat generation and electrical changes due to abnormal phenomena that occur inside semiconductor devices.

Complimenting our line of high performance failure analysis tool and detector hardware, Hamamatsu introduces a new software tool for enhance FA productivity.

High-precision thickness measurement are made without contact and without damaging the sample by using a optical system.

The plasma emissions during processes, such as etching, sputtering and CVD, that use plasma for semiconductor production are monitored in real time.

The inside of semiconductor devices is observed using infrared illumination, which passes through silicon, and a camera with sensitivity to the near infrared range.

The quantum yield for light emissions in organic LED materials is measured using the photoluminescence method.