Multiband Plasma-Process Monitor

The Multiband Plasma-Process Monitor (MPM) is a system specifically designed for monitoring the optical plasma emissions that are created during the various manufacturing processes of semiconductors including etching, sputtering, cleaning, and CVD. The MPM can handle multi-channel recording in real-time.

Product Information

FEATURES
･  Simultaneous  measurement  from  200  to  950  nm
･  High  levels  of  accuracy  and  reliability
･  Easy  measurement  using  optical  fiber  input
･  Software  for  measurement,  analysis  and  factory  integration
･  Easy  fab  Integration

APPLICATIONS
･  End-point  detection  of  etching
･  Optimization  of  process  conditions
･  Plasma  species  presumption
･  Optimization  of  a  cleaning  cycle